Homegrown Immersion DUV Systems

Shanghai Aishengna Launched Its Mass‑Produced DUV Tool

Shanghai Aishengna Electronic Technology Group has begun producing immersion deep-ultraviolet lithography systems designed to print circuit patterns onto silicon wafers. The state-backed Shanghai company is expected to deliver its first machines to SMIC, Hua Hong Semiconductor and ChangXin Memory Technologies in 2026, marking a notable step in China’s domestic semiconductor equipment push.

The systems are designed to support 28nm-class patterning in a single exposure and could reach more advanced nodes through multiple patterning. Initial production targets remain limited, at roughly five units in 2026 and 20 in 2027, while some critical components are still sourced internationally and local supplier delays have affected output.

For Chinese chipmakers, a domestic DUV supplier could reduce dependence on foreign lithography equipment and strengthen supply-chain resilience. However, long-term competitiveness will depend on whether the machines can match established systems in reliability, throughput, yield and service at high-volume production scale.

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