High NA Chip Manufacturing

Intel Produces Commercial Chips Using High NA EUV

High NA chip manufacturing is advancing semiconductor production by bringing next-generation lithography into commercial-scale manufacturing. Intel Foundry has begun producing select Intel Core Ultra Series 3 processors using ASML's High NA extreme ultraviolet (EUV) lithography, enabling more precise patterning for advanced chips built on the Intel 18A process. The technology improves manufacturing accuracy while supporting higher transistor density and greater process control, helping pave the way for increasingly powerful processors designed for AI, high-performance computing and other demanding applications.

For chip manufacturers, High NA EUV can improve production efficiency by reducing patterning complexity and supporting future process scaling. Early deployment in high-volume manufacturing also allows companies to refine production workflows before expanding the technology to additional products and fabrication nodes. As demand for AI computing continues to accelerate, advanced lithography is becoming a critical capability for producing more powerful, energy-efficient semiconductors at commercial scale.

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